TZO Target
Product introduction
With plasma as the heat source, high purity and high density TZO target is produced from respective powders, which are heated to molten or semi-molten state and deposited on the surface of backing tube at high speeds to form dense coatings.
Applications
AR film ofoptical glasses
Low-E glasses
Tool and decorative coatings
Product features
The uniformity of film formation was ≤3%
The sputtering power is about 12.5kW/m
The sputtering rate is 1.8-2 times higher than that of zinc tin
